Chemical Concentration Monitor
HORIBA’s chemical concentration monitors measure the concentration of various chemical materials i.e. SC-1, SC-2, SPM, HF etc. in real-time. This monitor can be used in the cleaning and etching processes within semiconductor manufacturing.
HORIBA's chemical concentration monitors can measure up to eight components of multi component chemicals (depending on product model). And also have monitors to measure single component chemicals to ensure a perfect match to your manufacturing process and facility.
All the models are highly accurate and stable. From the below line-up, choose the best chemical concentration monitor that meets your needs.
Chemical Concentration Monitor
Enables highly stable, precise measurement of multi components chemical solution utilizing HORIBA's spectroscopic measurement technology
Enables improved cleaning process efficiency with "high temperature chemical measurement", "stable operation" and "compact body size" to meet leading-edge process requirements.
Support for multi-batu, single-bath, and dingle-wafer cleaning systems
Chemicals soulution concentration monitor has a compact profile, support for multi-bath, single-bath, and dingle-wafer cleaning systems
HF Monitor
High precision, high-speed measurement of low concentrations of HF, HCl, and NH3. Resistance sensor.
Middle range HF / HCl concentration Monitor. The sensor is highly resistant to chemicals.
Measurement range: 0 -10%
Wide range HF concentration monitor from low to undiluted liquid. High precision measurement with auto range switching function. All PFA sensors.
Citric Acid Monitor
KOH Monitor
High precision, wide-range KOH monitor having chemical resistance sensor. Measurement range : 0 - 20%.
TMAH Monitor
High precision TMAH monitor can measure the range from 0 - 3 %. Chemical resistance carbon sensor. Suitable for management of TMAH concentration in developer solution.
TMAH monitor can measure the wide range from 0 - 10 %. Chemical resistance carbon sensor. Suitable for management of TMAH concentration in developer solution.
Dissolved Ozone Monitor
High precision, wide-range dissolved ozone monitor. In-line type sensor.
High stability measurement H2O2 concentration. Wide range measurement, 0 - 1000 ppm / 0 - 4000 ppm / 0 - 1% / 0 - 5%
Dissolved Oxygen Monitor
High stability measurement dissolved oxygen concentration in low concentration HF. Automatically switches between three measurement ranges from μg/L to mg/L. Measurement range : 0 - 20.00 mg/L.
Chemical Resistivity Meter
Carbon sensor resistivity meter. Measurement range: 0 - 100.0 MΩ・cm
Resistivity meter having the 2-channel carbon sensor. Measurement range: 0 - 100.0 MΩ・cm
Compact resistivity meter for versatile porpose. Measurement range: 0 - 100.0 MΩ・cm
Conductivity Meter
Carbon sensor compact conductivity meter for low concentration. Measurement range: 0 - 9999 μS/cm (Sensor FS-07F), 0 - 999 μS/cm (Sensor ESH-01-L-GC5), 0 - 9999 μS/cm (Sensor ESH-1-L-GC9).
Wide range, carbon sensor conductivity meter for high concentration. Measurement rage: 0 - 1000 mS/cm
Carbon sensor conductivity meter for low concentration. Measurement range: 0 - 1000 μS/cm, 0 - 10000 μS/cm (Sensor FS-07F)