Particle Detection System
HORIBA offers the below Particle Detection System to the leading-edge lithography process in the semiconductor manufacturing market, and they are widely used. These products detect particle on reticle/mask with high operating rated and long-term stability. They measures particles on each glass/pellicle surface with high throughput, contributing to yield improvements for any semiconductor manufacturing line. We also provide a Particle Remover that you can use in conjunction with the Particle Detection System.
Blanks Mask Particle Detection System
High speed and high accuracy inspection for blanks mask
Reticle/Mask Particle Detection System
Achieves dramatic cost reductions in advanced mask inspections
For use in combination with Manufacturing Devices. Low-cost reticle/mask particle inspection with enhanced versatility and compactness.
Low running costs thanks to a compact design, plus remarkable versatility
