Plasma monitors are required during the manufacturing processes when plasma is used.

Plasma monitors are used to monitor plasma emissions during the semiconductor manufacturing process, for example, etching and sputtering.

HORIBA offers two in-situ real time plasma monitors for the plasma process:

• The Optical Emission Spectroscopy Etching End-point Monitor can detect end-point of plasma etching.
• The Real Time Interferometric Process Monitor provides high precision detection of film thickness and trench depth during the etching and coating process.